Abstract Details 36

Ultra-high aspect ratio, high resolution nanofabrication for x-ray diffractive optics
Abstract ID 36
Presenter Chieh Chang
Presentation Type Poster
Full Author List Chieh Chang, Anne Sakdinawat
Affiliations SLAC
Category  
Abstract A new method for producing ultra-high aspect ratio, high resolution nanostructures for x-ray diffractive optics is presented.  This method, based on metal-assisted chemical etching, is capable of producing structures with greater than 1:100 aspect ratios, high resolution, smooth sidewalls, large areas, and arbitrary patterning.  This provides a pathway for producing very high efficiency diffractive optics for energies ranging from EUV to hard x-rays.
Footnotes  
Funding Acknowledgement